Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform

Feng Xu; Hu Song; Shaolin Zhou

doi:10.1117/1.3609007

1 August 2011 Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform

Feng Xu, Hu Song, Shaolin Zhou

Author Affiliations +

Optical Engineering, Vol. 50, Issue 8, 088001 (August 2011). https://doi.org/10.1117/1.3609007

Abstract

A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Feng Xu, Hu Song, and Shaolin Zhou "Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform," Optical Engineering 50(8), 088001 (1 August 2011). https://doi.org/10.1117/1.3609007

Published: 1 August 2011

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