Ultrafast reflection and secondary ablation in laser processing of transparent dielectrics with ultrashort pulses

Mingying Sun; Urs Eppelt; Wolfgang Schulz; Jianqiang Zhu

doi:10.1117/1.OE.53.5.051512

27 January 2014 Ultrafast reflection and secondary ablation in laser processing of transparent dielectrics with ultrashort pulses

Mingying Sun, Urs Eppelt, Wolfgang Schulz, Jianqiang Zhu

Author Affiliations +

Optical Engineering, Vol. 53, Issue 5, 051512 (January 2014). https://doi.org/10.1117/1.OE.53.5.051512

Abstract

Ultrafast reflection and secondary ablation have been theoretically investigated with a Fresnel-Drude model in laser processing of transparent dielectrics with picosecond pulsed laser. The time-dependent refractive index has a crucial effect on the cascade ionization rate and, thereby, on the plasma generation. The relative roles of the plasma gas and the incident angle in the reflection are discussed in the case of the oblique incidence. The angular dependence of the reflectivity on the laser-excited surface for s- and p-polarization is significantly different from the usual Fresnel reflectivity curve in the low-fluence limit. A road map to the secondary ablation induced by the reflected pulse is obtained on the angles of the first and second incidence. It indicates that the laser-induced plasma plays a major role in the secondary ablation, which could overcome the saturation of the ablation crater depth or generate microcracks underneath the crater wall.

Citation Download Citation

Mingying Sun, Urs Eppelt, Wolfgang Schulz, and Jianqiang Zhu "Ultrafast reflection and secondary ablation in laser processing of transparent dielectrics with ultrashort pulses," Optical Engineering 53(5), 051512 (27 January 2014). https://doi.org/10.1117/1.OE.53.5.051512

Published: 27 January 2014

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