Influence of deposition temperature and SiO2 overcoat layer on laser resistance of 532-nm high-reflection coating

Meiping Zhu; Tingting Zeng; Jingping Li; Jian Sun; Kui Yi; Jianda Shao

doi:10.1117/1.OE.57.12.121902

11 September 2018 Influence of deposition temperature and SiO₂ overcoat layer on laser resistance of 532-nm high-reflection coating

Meiping Zhu, Tingting Zeng, Jingping Li, Jian Sun, Kui Yi, Jianda Shao

Author Affiliations +

Optical Engineering, Vol. 57, Issue 12, 121902 (September 2018). https://doi.org/10.1117/1.OE.57.12.121902

Abstract

In this work, 532-nm high-reflection (HR) coatings have been deposited at different deposition temperatures by electron-beam evaporation technology. The spectral performance, e-field distribution, surface roughness, stoichiometry, as well as the laser resistance of the prepared 532-nm HR coatings are investigated. Experimental results indicate that the LIDT of the 532-nm HR coatings can be greatly influenced by deposition temperature. A relatively high deposition temperature benefits the crystallization and oxidation, and improves the LIDT of the 532-nm HR coatings. In addition, the SiO₂ overcoat layer is also demonstrated to be effective in suppressing the delamination damage morphology and improving the LIDT of the 532-nm HR coatings.

Citation Download Citation

Meiping Zhu, Tingting Zeng, Jingping Li, Jian Sun, Kui Yi, and Jianda Shao "Influence of deposition temperature and SiO₂ overcoat layer on laser resistance of 532-nm high-reflection coating," Optical Engineering 57(12), 121902 (11 September 2018). https://doi.org/10.1117/1.OE.57.12.121902

Received: 23 January 2018; Accepted: 3 July 2018; Published: 11 September 2018

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