Dr. A Meyyappan
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Photomasks, Scanning probe microscopy, Quartz, Phase shifts, Chromium, Semiconducting wafers, Etching, Silicon, Capillaries, Computer aided design

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Critical dimension metrology, Scanning probe microscopes, Edge roughness, Scanning probe microscopy, Metrology, Etching, Semiconductor manufacturing, Semiconductors, Manufacturing, Control systems

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Scanning probe microscopy, Surface roughness, Scanning electron microscopy, Edge roughness, Semiconductor manufacturing, Scanning probe microscopes, Atomic force microscope, Atomic force microscopy, Line edge roughness, Servomechanisms

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Critical dimension metrology, Nondestructive evaluation, Atomic force microscopy, Process control, Manufacturing, Algorithm development, Semiconducting wafers, Pattern recognition, Microelectronics, Metrology

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Mask making, Diagnostics, Atomic force microscopy, Surface roughness, Atomic force microscope, Image quality, Manufacturing, Phase shifts, Silicon, Semiconducting wafers

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top