Mr. Aamod Shanker
Doctoral Candidate at Univ of California Berkeley
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | June 1, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Atomic force microscopy, Photoresist materials, Fractal analysis, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, EUV optics

PROCEEDINGS ARTICLE | May 14, 2018
Proc. SPIE. 10656, Image Sensing Technologies: Materials, Devices, Systems, and Applications V
KEYWORDS: Phase contrast, Speckle, Scattering, Light scattering, Physics, Mathematics, Photomasks, Geometrical optics, Dynamical systems, Electromagnetic scattering theory

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Phase contrast, Imaging systems, Speckle, Scattering, Scanners, Light scattering, Photomasks, Extreme ultraviolet, Airborne remote sensing

SPIE Journal Paper | September 21, 2017
NPh Vol. 4 Issue 03
KEYWORDS: Brain, Neurons, Tissue optics, Scattering, Neuroimaging, Light scattering, Imaging systems, Neurophotonics, Visible radiation, Electrical engineering

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9713, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXIII
KEYWORDS: Microscopes, Optical transfer functions, Holography, Imaging systems, Spatial frequencies, Speckle, Scattering, Cameras, Fourier transforms, Diffusers

PROCEEDINGS ARTICLE | November 9, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Refractive index, Finite-difference time-domain method, Deep ultraviolet, Silica, Polarization, Opacity, Phase shift keying, Near field, Photomasks, Phase measurement, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Binary data, Airborne remote sensing, 193nm lithography, Absorption

Showing 5 of 10 publications
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