Aaron Cordes
Metrology Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Electron beams, Metrology, Data modeling, Atomic force microscopy, Optical testing, Scanning electron microscopy, Data acquisition, Optical simulations, Scanning probe microscopy, Semiconducting wafers

SPIE Journal Paper | November 4, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Silicon, Scattering, X-rays, Hydrogen, Critical dimension metrology, Annealing, Metrology, Scatter measurement, Double patterning technology

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Edge detection, Metrology, Detection and tracking algorithms, Silicon, Image resolution, Scanning electron microscopy, 3D metrology, Optical simulations, Critical dimension metrology, Lawrencium

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Metrology, Sensors, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Line edge roughness, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Calibration, Atomic force microscopy, Transmission electron microscopy, Tomography, Data acquisition, 3D metrology, Line edge roughness, Standards development, Iridium

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Oxides, Metrology, Etching, Silicon, Image resolution, Scanning electron microscopy, Scanning helium ion microscopy, 3D metrology, Critical dimension metrology

Showing 5 of 23 publications
Conference Committee Involvement (3)
Instrumentation, Metrology, and Standards for Nanomanufacturing VIII
20 August 2014 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
28 August 2013 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
13 August 2012 | San Diego, California, United States
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