Aasutosh Dave
SPIE Involvement:
Publications (19)

Proceedings Article | 12 April 2013 Paper
Jojo Pei, Feng Shao, Omar ElSewefy, Cynthia Zhu, Verne Xu, Yu Zhu, Liguo Zhang, Xuelong Shi, Qingwei Liu, Aasutosh Dave
Proceedings Volume 8683, 86831M (2013) https://doi.org/10.1117/12.2013704
KEYWORDS: Source mask optimization, Resolution enhancement technologies, Neodymium, Optical proximity correction, Photomasks, Ions, Molybdenum, Laser induced plasma spectroscopy, Logic, Calibration

Proceedings Article | 12 April 2013 Paper
Jacky Cheng, Robin Chia, Ying Gong, Omar ElSewefy, GekSoon Chua, YeeMei Foong, Aasutosh Dave, Alvin Chua, DongQing Zhang, Vlad Liubich, Pat Lacour, Alex Tritchkov
Proceedings Volume 8683, 86830K (2013) https://doi.org/10.1117/12.2013605
KEYWORDS: Resolution enhancement technologies, Optical proximity correction, Source mask optimization, SRAF, Photomasks, Optimization (mathematics), Manufacturing, Tolerancing, Semiconducting wafers, Double patterning technology

Proceedings Article | 13 March 2012 Paper
Minchul Oh, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Aasutosh Dave, John Sturtevant, Uwe Hollerbach, Thuy Do, Yuri Granik, Kostas Adam, Juhwan Kim, Cynthia Zhu, S. W. Jung
Proceedings Volume 8326, 83262R (2012) https://doi.org/10.1117/12.917984
KEYWORDS: Photomasks, Optical proximity correction, Oxides, Critical dimension metrology, Semiconducting wafers, Reflectivity, Calibration, Data modeling, Model-based design, Photoresist materials

Proceedings Article | 13 March 2012 Paper
Aasutosh Dave, Kenji Yoshimoto, John Sturtevant
Proceedings Volume 8326, 83261K (2012) https://doi.org/10.1117/12.917885
KEYWORDS: Extreme ultraviolet, Photoresist materials, Calibration, Capillaries, Data modeling, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, 3D modeling, Critical dimension metrology

Proceedings Article | 14 October 2011 Paper
John Sturtevant, Aasutosh Dave, Uwe Hollerbach
Proceedings Volume 8166, 81663Y (2011) https://doi.org/10.1117/12.898494
KEYWORDS: Photoresist materials, Capillaries, Manufacturing, Lithography, Logic, Critical dimension metrology, Plasma etching, Etching, Process engineering, Visibility

Showing 5 of 19 publications
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