Mr. Aasutosh Dave
Technical Marketing Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Logic, Calibration, Ions, Laser induced plasma spectroscopy, Photomasks, Source mask optimization, Optical proximity correction, Neodymium, Molybdenum, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Manufacturing, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Data modeling, Calibration, Capillaries, 3D modeling, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Logic, Etching, Capillaries, Manufacturing, Photoresist materials, Plasma etching, Critical dimension metrology, Process engineering, Visibility

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Cadmium, Data modeling, Visualization, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Panoramic photography, Semiconducting wafers, Process modeling

Showing 5 of 19 publications
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