Dr. Abbas Rastegar
Director of Technology at Applied Materials Inc
SPIE Involvement:
Author
Publications (30)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Titanium dioxide, Nickel, Silicon, Chemistry, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Silica, Aerosols, Particles, Ions, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers, Atmospheric particles

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Multilayers, Carbon dioxide, Gases, Oxygen, Transducers, Photomasks, Extreme ultraviolet, Cavitation, Acoustics, Ruthenium

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Particles, Ions, Lamps, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Radiation effects, Ruthenium

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Multilayers, Defect detection, Particles, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Ruthenium

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Oxides, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Radiation effects, Ruthenium, Oxidation

Showing 5 of 30 publications
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