Dr. Abdelkarim Mercha
at IMEC
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Photovoltaics, Logic, Optical lithography, Electrodes, Metals, Gallium arsenide, Diffusion, Manufacturing, Transistors, Field effect transistors, CMOS technology, Extreme ultraviolet lithography, Design for manufacturability, Nanowires

SPIE Journal Paper | February 25, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Optical lithography, Metals, Copper, Resistance, Extreme ultraviolet, Tungsten, Back end of line, Critical dimension metrology, Capacitance, CMOS technology

PROCEEDINGS ARTICLE | April 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Semiconductors, Lithography, Surface plasmons, Optical lithography, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Optical lithography, Nano opto mechanical systems, Metals, Scanners, Reliability, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Optical lithography, Metals, Manufacturing, Scanning electron microscopy, Capacitance, Photomasks, Optical proximity correction, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Deep ultraviolet, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Standards development

Showing 5 of 12 publications
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