Ms. Abeer Singhal Profile

Abeer Singhal

at Future Foundation Instruments

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Proceedings Article | 17 May 2005 Paper

Inheritance scheme for cascading lithography process control parameters technology, layer, and tool

Christopher Gould, Abeer Singhal, Yuanting Cui

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.598749

KEYWORDS: Semiconducting wafers, Lithography, Manufacturing, Process control, Process modeling, Control systems, Tolerancing, Data modeling, Critical dimension metrology, Metrology

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In today’s highly competitive markets, it is imperative for a manufacturing fab to perform with a high capability to adapt to the latest technologies, while being flexible to change part mix to meet dynamic market demands and at the same time achieve a high throughput to maximize productivity. The ability for a fab to adjust in this multi-part, mixed technology environment requires advanced control mechanisms to ensure that the correct control settings are used for each wafer processed. These circumstances are compelling fabs globally to gain the ability to introduce a multitude of parts with the correct control settings without having to relearn before processing. In this paper the concept of controller state is explored to address these issues by studying mechanisms to predict post-event settings. The concept of inheritance is explored to expand the controller state capability to predict optimized process settings across parts and tools. This paper explores the development and implementation of these mechanisms at Infineon Technologies, Richmond to reduce send-ahead (SAHD) and rework events. The benefits of controller state to handle tool events and part introductions are illustrated using events such as scheduled preventive maintenance, hardware upgrades, porting parts across tools and reintroduction of low runner parts back into production.

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