Abhinav Rastogi
at Cornell Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electron beam lithography, Chemical species, Polymers, Molecules, Oxygen, Photoresist materials, Extreme ultraviolet, Picosecond phenomena, Photoresist developing

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