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Dr. Abhishek Asthana
Data Scientist at Lam Research
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Publications (4)
Proceedings Article | 20 March 2018 Presentation + Paper
Optimization of optical proximity correction to reduce mask write time using genetic algorithm
Proceedings Volume 10588, 1058806 (2018) https://doi.org/10.1117/12.2297400
KEYWORDS: Optical proximity correction, Genetic algorithms, Optimization (mathematics), Photomasks, Data processing
Proceedings Article | 5 October 2016 Paper
Auto-score system to optimize OPC recipe parameters using genetic algorithm
Liang Cao, Abhishek Asthana, Guoxiang Ning, Jui-Hsuan Feng, Jie Zhang, William Wilkinson
Proceedings Volume 9985, 998525 (2016) https://doi.org/10.1117/12.2241178
KEYWORDS: Optical proximity correction, Genetic algorithms, Algorithms, Bridges, Genetics, Ions, Computer simulations, Lithography, Yield improvement, Semiconducting wafers
Proceedings Article | 23 March 2016 Paper
Expanding the printable design space for lithography processes utilizing a cut mask
Jerome Wandell, Mohamed Salama, William Wilkinson, Mark Curtice, Jui-Hsuan Feng, Shao Wen Gao, Abhishek Asthana
Proceedings Volume 9781, 978112 (2016) https://doi.org/10.1117/12.2219201
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Double patterning technology, Optical lithography, Design for manufacturability, Manufacturing, Lithographic illumination, Semiconductors, Logic devices, Printing, Photovoltaics, Analog electronics, Etching, Line width roughness, SRAF
Proceedings Article | 15 March 2016 Paper
OPC recipe optimization using genetic algorithm
Abhishek Asthana, Bill Wilkinson, Dave Power
Proceedings Volume 9780, 97800J (2016) https://doi.org/10.1117/12.2219166
KEYWORDS: Inspection, Optical proximity correction, Genetic algorithms, Standards development, Optimization (mathematics), Resolution enhancement technologies, Computational lithography, Metals, Photomasks, Photovoltaics
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