Abhishek Shendre
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 21 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Data modeling, Inspection, Scanning electron microscopy, Gallium nitride, Digital imaging, Neural networks, Photomasks, Semiconductor manufacturing, Computer aided design, Semiconducting wafers

Proceedings Article | 10 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Manufacturing, Photomasks, Extreme ultraviolet, Immersion lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Data modeling, Computer simulations, Scanning electron microscopy, Neural networks, Photomasks, Semiconductor manufacturing, Artificial intelligence, Semiconducting wafers

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Optical lithography, Manufacturing, Monte Carlo methods, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers

Proceedings Article | 31 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Point spread functions, Data modeling, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Raster graphics, Electro optical modeling, Process modeling, Vestigial sideband modulation

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