Mr. Abhishek Shendre Profile

Abhishek Shendre

at D2S Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 21 October 2019 Paper

Making digital twins using the Deep Learning Kit (DLK)

Linyong Pang, Suhas Pillai, Thang Nguyen, Mike Meyer, Ajay Baranwal, Henry Yu, Mariusz Niewczas, Ryan Pearman, Abhishek Shendre, Aki Fujimura

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Data modeling, Inspection, Scanning electron microscopy, Gallium nitride, Digital imaging, Neural networks, Photomasks, Semiconductor manufacturing, Computer aided design, Semiconducting wafers

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Proceedings Article | 10 October 2019 Paper

Adopting curvilinear shapes for production ILT: challenges and opportunities

Ryan Pearman, Jeff Ungar, Nagesh Shirali, Abishek Shendre, Mariusz Niewczas, Leo Pang, Aki Fujimura

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Manufacturing, Photomasks, Extreme ultraviolet, Immersion lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 27 June 2019 Paper

How GPU-accelerated simulation enables applied deep learning for masks and wafers

Linyong Pang, Mariusz Niewczas, Mike Meyer, Ryan Pearman, Abhishek Shendre, Aki Fujimura

Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Lithography, Data modeling, Computer simulations, Scanning electron microscopy, Neural networks, Photomasks, Semiconductor manufacturing, Artificial intelligence, Semiconducting wafers

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Proceedings Article | 27 June 2019 Paper

How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+mask dual simulation

Ryan Pearman, Jeff Ungar, Nagesh Shirali, Abhishek Shendre, Mariusz Niewczas, Leo Pang, Aki Fujimura

Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Optical lithography, Manufacturing, Monte Carlo methods, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 31 October 2017 Presentation + Paper

Full-chip GPU-accelerated curvilinear EUV dose and shape correction

Ryan Pearman, Abhishek Shendre, Oleg Syrel, Harold Zable, Ali Bouaricha , Mariusz Niewczas , Bo Su , Leo Pang , Aki Fujimura

Proc. SPIE. 10451, Photomask Technology 2017

KEYWORDS: Point spread functions, Data modeling, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Raster graphics, Electro optical modeling, Process modeling, Vestigial sideband modulation

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