Dr. Abneesh Srivastava
Research Scientist at Entegris Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Switches, Contamination, Switching, Gases, Hydrogen, Nitrogen, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

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