Dr. Adam F. G. Leontowich
Postdoctorate at Canadian Light Source Inc
SPIE Involvement:
Publications (4)

Proceedings Article | 19 September 2017 Presentation
Jan Geilhufe, Adam F. Leontowich, Russ Berg, Chris Regier, Darwin Taylor, Jian Wang, John Swirsky, Chithra Karunakaran, Robert Peters, Mirwais Aktary, Adam Hitchcock, Stephen Urquhart
Proceedings Volume 10389, 103890P (2017) https://doi.org/10.1117/12.2275779
KEYWORDS: X-rays, Microscopes, Light sources, X-ray imaging, Tomography, Absorption spectroscopy, Liquids, Cryogenics, Temperature metrology, Nanoprobes

Proceedings Article | 3 May 2013 Paper
Adam F. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry Chapman, Saša Bajt
Proceedings Volume 8777, 87770T (2013) https://doi.org/10.1117/12.2022403
KEYWORDS: Multilayers, Free electron lasers, Photomicroscopy, Polymethylmethacrylate, Optical testing, Signal attenuation, Mirrors, Reflectivity, Photons, X-ray optics

Proceedings Article | 21 March 2012 Paper
Adam F. Leontowich, Adam Hitchcock
Proceedings Volume 8323, 83231D (2012) https://doi.org/10.1117/12.915803
KEYWORDS: Polymethylmethacrylate, X-rays, Absorption, Optical lithography, X-ray lithography, Nanolithography, Polymers, Scanning electron microscopy, Lithography, Electron beam lithography

Proceedings Article | 19 May 2011 Paper
Adam F. Leontowich, Tolek Tyliszczak, Adam Hitchcock
Proceedings Volume 8077, 80770N (2011) https://doi.org/10.1117/12.887553
KEYWORDS: Point spread functions, X-rays, Zone plates, Microscopes, Photoresist materials, X-ray lithography, Polymethylmethacrylate, Electron beam lithography, Atomic force microscopy, Light sources

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