Dr. Adam F. G. Leontowich
Postdoctorate at Canadian Light Source Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 3, 2013
Proc. SPIE. 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
KEYWORDS: Multilayers, Free electron lasers, Photomicroscopy, Polymethylmethacrylate, Optical testing, Signal attenuation, Mirrors, Reflectivity, Photons, X-ray optics

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Polymethylmethacrylate, X-rays, Absorption, Optical lithography, X-ray lithography, Nanolithography, Polymers, Scanning electron microscopy, Lithography, Electron beam lithography

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8077, Damage to VUV, EUV, and X-ray Optics III
KEYWORDS: Point spread functions, X-rays, Zone plates, Microscopes, Photoresist materials, X-ray lithography, Polymethylmethacrylate, Electron beam lithography, Atomic force microscopy, Light sources

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