Dr. Adam F. G. Leontowich
Postdoctorate at Canadian Light Source Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 3, 2013
Proc. SPIE. 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
KEYWORDS: Mirrors, Multilayers, X-ray optics, Polymethylmethacrylate, Signal attenuation, Photons, Reflectivity, Optical testing, Photomicroscopy, Free electron lasers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymethylmethacrylate, Polymers, X-rays, Scanning electron microscopy, X-ray lithography, Nanolithography, Absorption

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8077, Damage to VUV, EUV, and X-ray Optics III
KEYWORDS: Microscopes, Electron beam lithography, Point spread functions, Light sources, Polymethylmethacrylate, X-rays, Atomic force microscopy, Photoresist materials, Zone plates, X-ray lithography

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