Dr. Adam R. Pawloski
Scientist at Affymetrix Inc
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 11 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Spatial frequencies, Etching, Image processing, Photoresist materials, Smoothing, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

SPIE Journal Paper | 1 April 2006
JM3 Vol. 5 Issue 02
KEYWORDS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Optical lithography, Etching, Image processing, Nickel, Scanning electron microscopy, Photoresist materials, Image quality, Line edge roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Line width roughness, Plasma etching, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Plasma

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Image processing, Diffusion, Scanning electron microscopy, Printing, Immersion lithography, Line edge roughness, Photomicroscopy, Thin film coatings, Photoresist processing

Showing 5 of 23 publications
Conference Committee Involvement (4)
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXV
25 February 2008 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
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