Dr. Adam R. Pawloski
Scientist at Affymetrix Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

Proceedings Article | 11 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Line edge roughness, Etching, Photoresist materials, Spatial frequencies, Lithography, Smoothing, Image processing, Critical dimension metrology, Semiconducting wafers, Photoresist processing

SPIE Journal Paper | 1 April 2006
JM3 Vol. 5 Issue 02
KEYWORDS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line edge roughness, Etching, Photoresist processing, Photoresist materials, Scanning electron microscopy, Image processing, Image quality, Nickel, Semiconducting wafers, Optical lithography

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Line width roughness, Photoresist processing, Lithography, Plasma, Critical dimension metrology, Scanning electron microscopy, Plasma etching

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line edge roughness, Thin film coatings, Scanning electron microscopy, Printing, Lithography, Photoresist processing, Photomicroscopy, Immersion lithography, Image processing, Diffusion

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Extreme ultraviolet, Contrast transfer function, Critical dimension metrology, Extreme ultraviolet lithography, Lithography, Printing, Line edge roughness, Fiber optic illuminators, Wavefronts, Interferometry

Showing 5 of 23 publications
Conference Committee Involvement (4)
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXV
25 February 2008 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
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