Adam C. Smith
Photomask Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 17 October 2019 Presentation
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Signal attenuation, Silicon, Inspection, Photonics, Photomasks, Optical proximity correction, Mask making, Silicon photonics, Semiconducting wafers, Data corrections

Proceedings Article | 16 October 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Data processing, Photomasks, Computed tomography, Optical proximity correction, Chemical elements, Operating systems, Electronic design automation

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Calibration, Manufacturing, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

Proceedings Article | 6 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Calibration, Distortion, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Back end of line

Showing 5 of 11 publications
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