Mrs. Adisa Paulson
Engineer at Micronic Laser Systems AB
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Etching, Manufacturing, Reflectivity, Photomasks, Photoresist processing, Binary data, Standards development

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Etching, Reflectivity, Image resolution, Photomasks, Photoresist processing, Binary data, Standards development

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Diffractive optical elements, Deep ultraviolet, Etching, Photomasks, Critical dimension metrology, Photoresist processing, Binary data, Standards development, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Deep ultraviolet, Diffusion, Manufacturing, Control systems, Photomasks, Critical dimension metrology, Photoresist processing, Temperature metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Deep ultraviolet, Etching, Resistance, Scanning electron microscopy, Photomasks, Excimer lasers, Photoresist processing, Semiconducting wafers, Optics manufacturing, 193nm lithography

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