Aelan Mosden
at Tokyo Electron America Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205604 (2022)
KEYWORDS: Field effect transistors, Etching, Dry etching, Very large scale integration, Isotropic etching, Dielectrics, Gallium arsenide, Transistors, Superlattices, Sodium

Proceedings Article | 25 May 2022 Presentation + Paper
L. Buzi, D. Koty, M. Hopstaken, J. Bruley, L. Gignac, M. Sagianis, D. Farmer, H. Miyazoe, A. Mosden, S. Engelmann, R. Bruce
Proceedings Volume 12056, 1205609 (2022)
KEYWORDS: Plasma, Etching, Plasma enhanced chemical vapor deposition, Oxygen, Argon, Refractive index, Hydrogen, FT-IR spectroscopy, Wet etching

Proceedings Article | 25 May 2022 Presentation + Paper
John Papalia, Devi Koty, Nathan Marchack, Scott Lefevre, Qingyun Yang, Aelan Mosden, Sebastian Engelmann, Robert Bruce
Proceedings Volume 12056, 1205603 (2022)
KEYWORDS: Etching, Polymers, Diffusion, Plasma etching, Ions, Silicon, Plasma, Semiconducting wafers, Scanning electron microscopy, Deep reactive ion etching, Reactive ion etching, Packaging

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111S (2021)
KEYWORDS: Scatterometry, Field effect transistors, Metrology, Process control, Nanowires, Spectroscopic ellipsometry, Optical lithography, Inspection, Etching, Semiconducting wafers

Proceedings Article | 6 April 2020 Presentation + Paper
Proceedings Volume 11323, 113230V (2020)
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

Showing 5 of 10 publications
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