Aelan Mosden
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Mueller matrices, Data modeling, Etching, Silicon, Transmission electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Field effect transistors, Critical dimension metrology, Optical materials characterization, Nanowires

Proceedings Article | 18 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Semiconductors, Etching, Gallium arsenide, Silicon, Transistors, Field effect transistors, Standards development, Group IV semiconductors, Isotropic etching, Nanowires

Proceedings Article | 27 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Optical lithography, Etching, Chemistry, Line width roughness, Wet etching, Plasma etching, Line edge roughness, Plasma, Back end of line, Front end of line

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