Ahlin Choi
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Critical dimension metrology, Statistical modeling, Data corrections

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Metrology, Diffractive optical elements, Imaging systems, Manufacturing, Quality measurement, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 April 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Apodization, Metrology, Polarization, Laser scattering, Quality measurement, Scatterometry, Image quality, Laser metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Metrology, Modulation, Scanners, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Visible radiation, Light sources, Imaging technologies, Optical testing, Signal processing, Integrated circuits, Semiconducting wafers, Electromagnetism, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Optical imaging, Metrology, Diffractive optical elements, Etching, Optical metrology, Process control, Semiconducting wafers, Overlay metrology, Model-based design, Process modeling

Showing 5 of 6 publications
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