Ahmad H. Elayat
at Siemens EDA
SPIE Involvement:
Publications (4)

Proceedings Article | 28 June 2013 Paper
Yoshiyuki Negishi, Yuki Fujita, Kazunori Seki, Toshio Konishi, Jed Rankin, Steven Nash, Emily Gallagher, Alfred Wagner, Peter Thwaite, Ahmad Elayat
Proceedings Volume 8701, 870112 (2013) https://doi.org/10.1117/12.2030765
KEYWORDS: Extreme ultraviolet lithography, Inspection, Metals, Extreme ultraviolet, Photomasks, Lithography, Tantalum, Mask making, Visualization, Computer simulations

Proceedings Article | 8 November 2012 Paper
Ahmad Elayat, Peter Thwaite, Steffen Schulze
Proceedings Volume 8522, 85221W (2012) https://doi.org/10.1117/12.979154
KEYWORDS: Photomasks, Extreme ultraviolet, Manufacturing, Reticles, Semiconducting wafers, Inspection, Databases, Optical proximity correction, Extreme ultraviolet lithography, Software development

Proceedings Article | 17 April 2012 Paper
Proceedings Volume 8352, 83520J (2012) https://doi.org/10.1117/12.923675
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Inspection, Semiconducting wafers, Manufacturing, Model-based design, Data processing, Resolution enhancement technologies, Forward error correction

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 816634 (2011) https://doi.org/10.1117/12.902443
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Inspection, Manufacturing, Semiconducting wafers, Optical alignment, Lithography, Model-based design, Forward error correction

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