Ahmed Seoud
IC Consultant Engineer at Siemens EDA
SPIE Involvement:
Publications (10)

Proceedings Article | 20 March 2018 Presentation + Paper
Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park
Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638
KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870L (2018) https://doi.org/10.1117/12.2297659
KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74883M (2009) https://doi.org/10.1117/12.829742
KEYWORDS: SRAF, Etching, Photovoltaics, Optical proximity correction, Resolution enhancement technologies, Photomasks, Visualization, Semiconducting wafers, Photoresist processing, Statistical analysis

Proceedings Article | 23 September 2009 Paper
Moutaz Fakhry, H. Maaty, A. Seoud
Proceedings Volume 7488, 748836 (2009) https://doi.org/10.1117/12.829714
KEYWORDS: Optical proximity correction, Photovoltaics, Visualization, Photomasks, Lead, Electroluminescence, Photomask technology, Current controlled current source, Shape analysis

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71220S (2008) https://doi.org/10.1117/12.801381
KEYWORDS: Double patterning technology, Photomasks, Resolution enhancement technologies, Optical proximity correction, Optical lithography, Logic, Photoresist processing, Etching, Computer aided design, Silicon

Showing 5 of 10 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top