Ahmed Seoud
IC Consultant Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photovoltaics, Statistical analysis, Visualization, Etching, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photovoltaics, Visualization, Electroluminescence, Photomasks, Shape analysis, Optical proximity correction, Photomask technology, Lead, Current controlled current source

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Logic, Optical lithography, Etching, Silicon, Photomasks, Double patterning technology, Optical proximity correction, Computer aided design, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Photomasks, Integrated circuits, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Optics manufacturing, Performance modeling, Systems modeling, Resolution enhancement technologies

Showing 5 of 10 publications
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