Dr. Ajit Paranjpe Profile

Dr. Ajit Paranjpe

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Publications (7)

Proceedings Article | 5 March 2021 Presentation

High performance MOCVD for micro LED applications

Ronald Arif, Soo Min Lee, Drew Hanser, Mark McKee, Eric Armour, Bumjoon Kim, Ajit Paranjpe, Bojan Mitrovic, Terry Toh

Proceedings Volume 11706, 1170613 (2021) https://doi.org/10.1117/12.2578842

KEYWORDS: Photonics, Metalorganic chemical vapor deposition, Silicon, Semiconducting wafers, Sapphire, Gallium arsenide, Yield improvement, Vertical cavity surface emitting lasers, Three dimensional sensing, Telecommunications

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Proceedings Article | 9 March 2020 Presentation

High-performance As/P MOCVD platform for emerging photonics applications (Conference Presentation)

Ronald Arif, Mark McKee, Eric Armour, Weimin Dong, Alex Zhang, Bojan Mitrovic, Drew Hanser, Ajit Paranjpe

Proceedings Volume 11300, 113000L (2020) https://doi.org/10.1117/12.2544914

KEYWORDS: Metalorganic chemical vapor deposition, Photonics, Vertical cavity surface emitting lasers, Photonic devices, Laser applications, Light emitting diodes, Three dimensional sensing, LIDAR, LED displays, Optical communications

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Proceedings Article | 19 August 2005 Paper

Improvement in total measurement uncertainty for gate CD control

Benjamin Bunday, Osman Sorkhabi, Youxian Wen, Ajit Paranjpe, Paul Terbeek, John Allgair, Amy Peterson

Proceedings Volume 5878, 58780M (2005) https://doi.org/10.1117/12.616344

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Amorphous silicon, Finite element methods, Metrology, Scatterometry, Data modeling, Oxides, Calibration, Reticles

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Proceedings Article | 10 May 2005 Paper

Strained-silicon metrology using a multi-technology optical system

Heath Pois, Stephen Morris, Jon Opsal, Ajit Paranjpe, Nyles Cody, Trevan Landin

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600035

KEYWORDS: Silicon, Data modeling, Semiconducting wafers, Germanium, Metrology, Optical metrology, Spectroscopy, Reflectometry, Spectrophotometry, Dispersion

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Proceedings Article | 16 April 1993 Paper

Characterization of a high-density plasma source for dry develop

Ajit Paranjpe, Cecil Davis

Proceedings Volume 1803, (1993) https://doi.org/10.1117/12.142915

KEYWORDS: Semiconducting wafers, Plasma, Ions, Etching, Antennas, Anisotropy, Control systems, Photoresist processing, Optical lithography, Dry etching

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Proceedings Article | 16 April 1993 Paper

In-situ monitoring of submicron polysilicon linewidths using diffraction gratings

Phillip Chapados, Ajit Paranjpe

Proceedings Volume 1803, (1993) https://doi.org/10.1117/12.142923

KEYWORDS: Scanning electron microscopy, Etching, Sensors, Semiconducting wafers, Diffraction, Diffraction gratings, Critical dimension metrology, In situ metrology, Process control, 3D modeling

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Proceedings Article | 1 February 1992 Paper

Interferometric monitoring and control of silicon incorporation in the diffusion-enhanced silylated resist process

Maureen Hanratty, Ajit Paranjpe, Steven Henck, Rhett Jucha

Proceedings Volume 1593, (1992) https://doi.org/10.1117/12.56917

KEYWORDS: Etching, Silicon, Interferometry, Semiconducting wafers, Dry etching, Diffusion, Photoresist processing, Interferometers, Photoresist materials, Head-mounted displays

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Showing 5 of 7 publications

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