Mr. Akihiko Otoguro
at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Quartz, Crystals, Photography, Scanning electron microscopy, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Water, Molecules, Crystals, Diffusion, Solids, Immersion lithography, Polymer thin films, Liquids

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Microfluidics, Optical lithography, Water, Photomasks, Resonance energy transfer, Immersion lithography, Photoresist processing, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Refractive index, Microfluidics, Water, Interferometry, Photoresist materials, Immersion lithography, Neodymium, Fluid dynamics, Absorption

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Transparency, Etching, Polymers, Resistance, Photoresist materials, Polymerization, Fluorine, Virtual colonoscopy, Absorption

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Microelectromechanical systems, Lithography, Transparency, Etching, Chemical species, Polymers, Resistance, Photoresist materials, Polymerization, Fluorine

Showing 5 of 10 publications
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