Akihiro Konda
at Osaka University
SPIE Involvement:
Publications (5)

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 1249814 (2023) https://doi.org/10.1117/12.2657889
KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Lithography, Silicon, Film thickness

Proceedings Article | 22 February 2021 Poster + Presentation
Proceedings Volume 11612, 116120Y (2021) https://doi.org/10.1117/12.2584016
KEYWORDS: Chromium, Electron beam lithography, Photomasks, Silicon, Semiconducting wafers, Line width roughness, Glasses, Electron beams, Quartz, Lithography

Proceedings Article | 20 September 2020 Presentation
Proceedings Volume 11518, 115180D (2020) https://doi.org/10.1117/12.2574963
KEYWORDS: Line width roughness, Electron beam lithography, Chemically amplified resists, Photomasks, Electron beams, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Electronic components

Proceedings Article | 23 March 2020 Presentation + Paper
Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa, T. Tamura
Proceedings Volume 11326, 113260G (2020) https://doi.org/10.1117/12.2551825
KEYWORDS: Polymers, Monte Carlo methods, Absorption, Chemically amplified resists, Photomasks, Temperature metrology, Ions, Lithography, Image processing, Semiconductors

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 977629 (2016) https://doi.org/10.1117/12.2218965
KEYWORDS: Silicon films, Quartz, Crystals, Lithography, Line width roughness, Photoresist processing, Extreme ultraviolet, Optical filters, Polymers, Polymer thin films

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