Dr. Akihisa Nagano
at Ushio Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Mirrors, Sputter deposition, Reliability, Laser development, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Plasma

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Ions, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Plasma, Tin

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Feedback control, Ruthenium, Plasma, Tin

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