Ms. Akiko Fujii
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 20, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Etching, Quartz, Image processing, Ultraviolet radiation, Manufacturing, Photomasks, Nanoimprint lithography, Line edge roughness, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Quartz, Ultraviolet radiation, Materials processing, Manufacturing, Photomasks, Mask making, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Etching, Quartz, Manufacturing, Photomasks, Beam shaping, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Deep ultraviolet, Opacity, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Silicon, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Photoresist processing, Defect inspection

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Etching, Dry etching, Reflectivity, Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Wafer testing

Showing 5 of 8 publications
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