Akiko Mimotogi
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Ultraviolet radiation, Computer simulations, Design for manufacturing, Double patterning technology, Computational lithography, Nanoimprint lithography, Photoresist processing, Optics manufacturing, Nanolithography, Design for manufacturability

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Diffraction, Lithographic illumination, Ions, Control systems, Photomasks, Immersion lithography, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Thin films, Lithography, Diffraction, Data modeling, Waveguides, Near field, Transmittance, Photomasks, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Diffraction, Refractive index, Lithographic illumination, Polarization, Pellicles, Projection systems, Transmittance, Photomasks, Immersion lithography

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Thin films, Lithography, Diffraction, Logic, Data modeling, Waveguides, Near field, Photomasks, Factor analysis, Focus stacking software

SPIE Journal Paper | October 1, 2006
JM3 Vol. 5 Issue 04
KEYWORDS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method

Showing 5 of 9 publications
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