Akiko Mimotogi
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Ultraviolet radiation, Computer simulations, Design for manufacturing, Double patterning technology, Computational lithography, Nanoimprint lithography, Photoresist processing, Optics manufacturing, Nanolithography, Design for manufacturability

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Diffraction, Lithographic illumination, Ions, Control systems, Photomasks, Immersion lithography, Critical dimension metrology, Neodymium

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Thin films, Lithography, Diffraction, Data modeling, Waveguides, Near field, Transmittance, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Diffraction, Refractive index, Lithographic illumination, Polarization, Pellicles, Projection systems, Transmittance, Photomasks, Immersion lithography

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Thin films, Lithography, Diffraction, Logic, Data modeling, Waveguides, Near field, Photomasks, Factor analysis, Focus stacking software

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top