Dr. Akinori Saeki
Assistant Professor at Osaka Univ
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Electron beams, FT-IR spectroscopy, Polymers, Chromium, Solids, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Image processing, Diffusion, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

SPIE Journal Paper | 1 October 2007
JM3 Vol. 6 Issue 04
KEYWORDS: Line edge roughness, Monte Carlo methods, Lithography, Molecules, Diffusion, Image enhancement, Electron beam lithography, Ionization, Electron beams, Polymers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Electron beams, Optical lithography, Polymers, Diffusion, Monte Carlo methods, Ionization, Line width roughness, Line edge roughness, Chemically amplified resists

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