Akio Misaka
at Semiconductor Co
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Collimation, Transmittance, Photomasks, Geometrical optics, Binary data, Light wave propagation, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Logic, Lithographic illumination, Photomasks, Logic devices, Source mask optimization, Optical proximity correction, Halftones, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Logic, Printing, Lab on a chip, Transmittance, Photomasks, Image enhancement, Immersion lithography, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Thin films, Lithography, Quartz, Printing, Transmittance, Photomasks, Critical dimension metrology, Halftones, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Lithographic illumination, Opacity, Photomasks, Image enhancement, Logic devices, Critical dimension metrology, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Phase shifting, Optical lithography, Printing, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Showing 5 of 10 publications
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