Dr. Akio Yamada
at Advantest Corp
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Microelectromechanical systems, Electron beam lithography, Electron beams, Glasses, Silicon, Photonics, Photomasks, Semiconducting wafers, Nanofabrication, Vestigial sideband modulation

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Electron beam lithography, Monochromatic aberrations, Electron beams, Magnetism, Objectives, Optical simulations, Beam shaping, Cesium, Electromagnetism, Vestigial sideband modulation

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Manufacturing, Chromium, Scanning electron microscopy, Printing, Photomasks, Optical simulations, Beam shaping, Chemical elements, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Information fusion, Semiconductors, Logic, Logic devices, High volume manufacturing, Chemical elements, Analog electronics, Multiplexers, Electron beam direct write lithography, Semiconducting wafers

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Optical lithography, Diffusion, Manufacturing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Photoresist processing, Beam analyzers, Chemically amplified resists

Showing 5 of 23 publications
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