Akira Hamaguchi
at KIOXIA Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: 3D metrology, Scanning electron microscopy, Monte Carlo methods, Calibration, 3D acquisition, Scattering, Nondestructive evaluation

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Scatterometry, Nondestructive evaluation, Inspection, Semiconducting wafers, Scattering, Silicon, X-rays, Scatter measurement, Signal detection

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconducting wafers, Image processing, Copper, Microscopy, Scanning electron microscopy, Safety, Semiconductors, Chemical mechanical planarization, Etching, Neodymium

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Oxides, Scanning electron microscopy, Monte Carlo methods, Silicon, Silica, Wet etching, Inspection, Optical spheres, Electron beams, Data acquisition

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Silica, Silicon, Electron beams, Dielectrics, Defect inspection, Optical simulations, Sensors, 3D modeling

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top