Akira Hamaguchi
at Toshiba Memory Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: 3D acquisition, Scattering, Calibration, Nondestructive evaluation, Scanning electron microscopy, Monte Carlo methods, 3D metrology

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Scattering, X-rays, Silicon, Inspection, Nondestructive evaluation, Scatterometry, Semiconducting wafers, Scatter measurement, Signal detection

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconductors, Safety, Etching, Image processing, Microscopy, Copper, Scanning electron microscopy, Neodymium, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Oxides, Electron beams, Optical spheres, Silica, Silicon, Inspection, Scanning electron microscopy, Data acquisition, Monte Carlo methods, Wet etching

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Electron beams, Silica, Sensors, Dielectrics, Silicon, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Defect inspection

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Electron beams, Silica, Scattering, Sensors, Silicon, Laser scattering, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Electron transport

Showing 5 of 10 publications
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