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Akira Terao
at Canon Inc
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Author
Publications (1)
Proceedings Article | 2 April 2007 Paper
Photo-deprotection resist based on photolysis of o-nitrobenzyl phenol ether; challenge to half-pitch 22 nm using near-field lithography
T. Ito, A. Terao, Y. Inao, T. Yamaguchi, N. Mizutani
Proceedings Volume 6519, 65190J (2007) https://doi.org/10.1117/12.711276
KEYWORDS: Photoresist materials, Near field, Lithography, Infrared spectroscopy, Line edge roughness, Photoresist processing, Photolysis, Silicon, Etching, Diffusion
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