Akitoshi Kawai
at Nikon Tsubasa Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Semiconductors, Polarization, Birefringence, Reflectivity, Photoresist materials, Objectives, Critical dimension metrology, Astronomical imaging, Semiconducting wafers

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Polarization, Inspection, Polarizers, Image analysis, Photoresist materials, Process control, Objectives, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Diffraction, Polarization, Birefringence, Inspection, Optical simulations, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Data modeling, Polarization, Birefringence, Inspection, Polarizers, Scanning electron microscopy, Objectives, Critical dimension metrology, Semiconducting wafers, Edge roughness

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