Dr. Akiyoshi Suzuki
Advisor at Gigaphoton Inc
SPIE Involvement:
Board of Directors | Fellow status | Conference Program Committee | Conference Co-Chair | Author | Editor
Publications (31)

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Lithography, Reticles, Wavefronts, Distortion, Projection systems, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Polarization, Scanners, Computer simulations, Image quality, Photomasks, Optical simulations, Optical proximity correction, Nanoimprint lithography, Optimization (mathematics)

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Polarization, Calibration, Electroluminescence, Photomasks, Optical simulations, Optical proximity correction, Nanoimprint lithography, Optimization (mathematics), Photoresist processing, Binary data

PROCEEDINGS ARTICLE | July 12, 2006
Proc. SPIE. 6342, International Optical Design Conference 2006
KEYWORDS: Monochromatic aberrations, Mirrors, Iron, Wavefront aberrations, Distortion, Projection systems, Aspheric lenses, Photomasks, Optical alignment, Combined lens-mirror systems

PROCEEDINGS ARTICLE | September 17, 2005
Proc. SPIE. 5921, Advances in Metrology for X-Ray and EUV Optics
KEYWORDS: Diffraction, Metrology, Interferometers, Wavefronts, Optical testing, Extreme ultraviolet, Charge-coupled devices, EUV optics, Shearing interferometers, Diffusion tensor imaging

Showing 5 of 31 publications
Conference Committee Involvement (17)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 17 published special sections
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