Akiyuki Sugiyama
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Etching, Process control, Finite element methods, Line width roughness, Directed self assembly, Chemical analysis, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

SPIE Journal Paper | 1 April 2011
JM3 Vol. 10 Issue 02
KEYWORDS: Overlay metrology, Scanning electron microscopy, Double patterning technology, Electron microscopes, Data modeling, Semiconducting wafers, Optical lithography, Lithography, Error analysis, Wafer-level optics

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Optical lithography, Detection and tracking algorithms, Control systems, Scanning electron microscopy, Double patterning technology, Algorithm development, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Lithography, Metrology, Data modeling, Visualization, Optical testing, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Semiconductors, Lithography, Edge detection, Metrology, Silicon, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Computer aided design

Showing 5 of 10 publications
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