Aksel Göhnermeier
at Carl Zeiss SMT AG
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Image processing, Solids, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Optics manufacturing, EUV optics, Fiber optic illuminators

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Thin films, Lithography, Diffraction, Optical lithography, Polarization, Birefringence, Pellicles, Photomasks, Optical proximity correction, Critical dimension metrology

SPIE Journal Paper | 1 July 2005
JM3 Vol. 4 Issue 03
KEYWORDS: Polarization, Diffraction, Wavefronts, Imaging systems, Zernike polynomials, Superposition, Jones vectors, Radio propagation, Birefringence, Lithography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Superposition, Diffraction, Polarization, Birefringence, Imaging systems, Wavefronts, Wave propagation, Zernike polynomials, Jones vectors, Radio propagation

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top