Prof. Alain C. Diebold
Dean of the College of Nanoscale Sciences at SUNY Polytechnic Institute
SPIE Involvement:
Fellow status | Conference Program Committee | Author
Publications (24)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10720, Nanophotonic Materials XV
KEYWORDS: Nanostructures, Second-harmonic generation, Nanoparticles, Chemical species, Metals, Annealing, Ions, Silicon, Silver, Harmonic generation

PROCEEDINGS ARTICLE | June 6, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Oxides, Metrology, Etching, Germanium, Silicon, Scatterometry, Process control, Spectroscopic ellipsometry, Critical dimension metrology, Chemical elements

SPIE Journal Paper | October 21, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Finite element methods, Copper, Plasmons, 3D modeling, Plasmonics, Dielectrics, Surface plasmons, Metals, Statistical modeling, Magnetism

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Thin films, Ellipsometry, Plasmonics, Plasmons, Surface plasmons, Copper, Dielectrics, 3D modeling, Scatterometry, 3D metrology, Finite element methods, Critical dimension metrology, Chemical elements, Statistical modeling

SPIE Journal Paper | March 14, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Directed self assembly, Critical dimension metrology, Scatterometry, Polymethylmethacrylate, Optical components, Picosecond phenomena, Optical simulations, Chemical elements, Optical lithography, Ellipsometry

SPIE Journal Paper | August 3, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Scanning electron microscopy, Picosecond phenomena, Chemical elements, Line width roughness, Optical properties

Showing 5 of 24 publications
Conference Committee Involvement (1)
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing
19 May 1999 | Edinburgh, United Kingdom
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