Dr. Alain Moussa
at imec
SPIE Involvement:
Publications (27)

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275005 (2023) https://doi.org/10.1117/12.2687549
KEYWORDS: Printing, 3D mask effects, Extreme ultraviolet, Simulations, Reticles, Photomask technology, Optical lithography, Metals, Lithography, Extreme ultraviolet lithography

SPIE Journal Paper | 17 November 2023
JM3, Vol. 22, Issue 04, 044001, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044001
KEYWORDS: Line width roughness, Fourier transforms, Critical dimension metrology, Metrology, Signal to noise ratio, Film thickness, Extreme ultraviolet lithography, Scanning electron microscopy, Photoresist processing, Image analysis

Proceedings Article | 27 April 2023 Presentation + Paper
Cong Chen, Dieter Van Den Heuvel, Matteo Beggiato, Bensu Tunca Altintas, Alain Moussa, Anne Vandooren, Bart Baudemprez, Michael Schöbitz, Wassim Khaldi, Janusz Bogdanowicz, Christophe Beral, Anne-Laure Charley
Proceedings Volume 12496, 124961B (2023) https://doi.org/10.1117/12.2657950
KEYWORDS: Inspection, Wafer bonding, Silicon, Microscopes, Scanning electron microscopy, Optical microscopes, Infrared microscopy

Proceedings Article | 27 April 2023 Presentation + Paper
A. Moussa, J. Bogdanowicz, B. Groven, P. Morin, M. Beggiato, M. Saib, G. Santoro, Y. Abramovitz, K. Houtchens, S. Ben Nissim, N. Meir, J. Hung, A. Urbanowicz, R. Koret, I. Turovets, G. Lorusso, A.-L. Charley
Proceedings Volume 12496, 124961X (2023) https://doi.org/10.1117/12.2657968
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Monolayers, Scatterometry, 2D materials, Metrology, Atomic force microscopy, Raman spectroscopy, Silicon, Histograms

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960I (2023) https://doi.org/10.1117/12.2658084
KEYWORDS: Ruthenium, Optical alignment, Semiconducting wafers, Overlay metrology, Oxides, Silicon, Metals, Etching, Scanners, Copper

Showing 5 of 27 publications
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