Alain Ostrovsky
at STMicroelectronics SA
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Metrology, Critical dimension metrology, Overlay metrology, Distortion, Etching, Visualization, Semiconducting wafers, Scanning electron microscopy, Image processing, Electron microscopes

Proceedings Article | 27 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Process control, Metrology, Image processing, Scanning electron microscopy, Optical lithography, Doping, Analytics, Silicon, Optical proximity correction, Visualization, Image quality

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Image quality, Scanning electron microscopy, Image processing, Critical dimension metrology, Image analysis, Process control, Optical proximity correction, Etching, Semiconducting wafers

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Microlens, 3D modeling, Lithography, Calibration, Atomic force microscopy, Data modeling, Computer aided design, Photoresist materials, Photoresist processing, Polymers, Edge detection

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Microlens, Neural networks, Image processing, Image classification, Metrology, Lithography, Convolutional neural networks, Imaging systems, Semiconducting wafers, Data modeling

Showing 5 of 13 publications
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