Alain Ostrovsky
at STMicroelectronics SA
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Etching, Image processing, Image analysis, Scanning electron microscopy, Image quality, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Edge detection, Data modeling, Calibration, Polymers, 3D modeling, Atomic force microscopy, Photoresist materials, Microlens, Computer aided design, Photoresist processing

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Convolutional neural networks, Data modeling, Imaging systems, Image processing, Microlens, Neural networks, Image classification, Semiconducting wafers

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, CMOS sensors, Metrology, Image processing, Quantum efficiency, Photodiodes, Scanning electron microscopy, Microlens, Neural networks

SPIE Journal Paper | 27 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Directed self assembly, Critical dimension metrology, Polymethylmethacrylate, Smoothing, Image processing, Materials processing, Edge detection, Polymers, Error analysis, Metrology

Showing 5 of 11 publications
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