Dr. Alan Hayes
Principal Research Scientist
SPIE Involvement:
Author
Area of Expertise:
Thin film , etching , ion source , ion beam , deposition , EUV
Websites:
Publications (5)

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Silica, Ions, Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Failure analysis, Ruthenium

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Multilayers, Chemical species, Particles, Silicon, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Molybdenum

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Etching, Particles, Ions, Manufacturing, Inspection, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Contamination, Iron, Electrodes, Particles, Silicon, Chromium, Photomasks, Extreme ultraviolet, Aluminum, Particle contamination

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Multilayers, Quartz, Ions, Silicon, Coating, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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