Dr. Alan Hayes
Principal Research Scientist
SPIE Involvement:
Author
Area of Expertise:
Thin film , etching , ion source , ion beam , deposition , EUV
Websites:
Publications (5)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Ruthenium, Failure analysis, Transmission electron microscopy, Ions, Silica, Multilayers

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Chemical species, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Silicon, Molybdenum, Deposition processes, Monte Carlo methods, Multilayers, Particles

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Inspection, Extreme ultraviolet, Deposition processes, Particles, Manufacturing, Ions

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Particles, Photomasks, Aluminum, Contamination, Extreme ultraviolet, Chromium, Electrodes, Silicon, Iron, Particle contamination

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Multilayers, Silicon, Coating, Quartz, Ions, Ion beams

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