Mr. Alan Kozlowski
at Red Zone Concepts LLC
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 29, 1998
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Lithography, Metals, Manufacturing, Photoresist materials, Photomasks, Critical dimension metrology, Structural design, Photoresist processing, Semiconducting wafers, Industrial chemicals

PROCEEDINGS ARTICLE | September 26, 1995
Proc. SPIE. 2640, Microlithography and Metrology in Micromachining
KEYWORDS: Gold, Image processing, Scanning electron microscopy, Photoresist materials, Plating, Photomicroscopy, Thin film coatings, Photoresist processing, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | July 1, 1991
Proc. SPIE. 1463, Optical/Laser Microlithography IV
KEYWORDS: Mathematical modeling, Signal to noise ratio, Lithography, Optical lithography, Imaging systems, Chemistry, Manufacturing, Signal processing, Process control, Semiconducting wafers

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