Dr. Alan J. Leslie
Director, Technology Enablement at GLOBALFOUNDRIES Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (3)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Genetic algorithms, Matrices, Image processing, Silicon, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Algorithm development, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical lithography, Data modeling, Etching, Silicon, Reflectivity, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Near field optics

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Photomasks, Integrated circuits, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Optics manufacturing, Performance modeling, Systems modeling, Resolution enhancement technologies

Conference Committee Involvement (1)
Photomask Technology
18 September 2007 | Monterey, California, United States
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