Dr. Alan E. Rosenbluth
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (27)

SPIE Journal Paper | April 28, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Calibration, Data modeling, Process modeling, Autoregressive models, Lithography, Photomasks, Statistical modeling, Monte Carlo methods, Photoresist processing, Optical proximity correction

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Coherence imaging, Modulation, Imaging systems, Spatial frequencies, Image processing, Error analysis, Complex systems, Computing systems, Image acquisition, Photomasks, Computational lithography, Optical proximity correction, Convolution, Systems modeling

SPIE Journal Paper | June 27, 2014
JM3 Vol. 13 Issue 02
KEYWORDS: Photomasks, Phase shifts, SRAF, Semiconducting wafers, Lithography, Opacity, Optical lithography, Scattering, Binary data, Polarization

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Diffraction, Visualization, Photomasks, Source mask optimization, Algorithm development, Standards development, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 27 publications
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