Dr. Alan R. Stivers
Consultant/Retired at
SPIE Involvement:
Conference Program Committee | Author
Publications (30)

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Thin films, Photovoltaics, Reticles, Data modeling, Error analysis, Distortion, Image registration, Finite element methods, Photomasks, Extreme ultraviolet

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Thin films, Reticles, Metrology, Distortion, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film deposition, Personal protective equipment

Proceedings Article | 29 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Multilayers, Metrology, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Defect inspection

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Etching, Image processing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Defect inspection

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Cadmium, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photomicroscopy, Semiconducting wafers

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Confocal microscopy, Optical spheres, Defect detection, Calibration, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection, Defect inspection

Showing 5 of 30 publications
Conference Committee Involvement (2)
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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