Dr. Albert Chen
at ASML
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Optical parametric oscillators, Optical lithography, Control systems, Data processing, Process control, High volume manufacturing, Feedback control, Semiconducting wafers, Overlay metrology

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Metrology, Lithium, Scanners, Time metrology, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Process modeling

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Control systems, Scatterometry, Finite element methods, Feedback control, Semiconducting wafers, Overlay metrology

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