Dr. Albrecht Ullrich
at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Diffraction, Mirrors, Metrology, Polarization, Remote sensing, X-rays, Reflectivity, Polarizers, Photomasks, Extreme ultraviolet

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Diffraction, Deep ultraviolet, Polarization, Scattering, X-rays, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Diffraction gratings

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Data modeling, Manufacturing, Inspection, Control systems, Scanning electron microscopy, Photomasks, Spatial resolution, Critical dimension metrology, Semiconducting wafers, Defect inspection

Showing 5 of 9 publications
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