Dr. Alek C. Chen
Director Technology at ASML San Jose
SPIE Involvement:
Conference Program Committee | Conference Chair | Symposium Chair | Author
Publications (45)

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Metals, Image segmentation, Image processing, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Back end of line

Proceedings Article | 7 April 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Particles, Photomasks, Extreme ultraviolet, Line width roughness, Immersion lithography, Critical dimension metrology, Photoresist processing, Stochastic processes, Absorption

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Metrology, Liquid phase epitaxy, Etching, Error analysis, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Stochastic processes

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Scatterometry, Signal processing, Process control, Photomasks, Optical proximity correction, Systems modeling, Process modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Image processing, Error analysis, Electroluminescence, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction, Optical alignment

Showing 5 of 45 publications
Conference Committee Involvement (10)
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVII
25 February 2013 | San Jose, California, United States
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
Showing 5 of 10 published special sections
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